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Filtration efficiency of ptfe single-component clothing membrane



PTFE single-component clothing film is an indispensable and important material in the production of masks. It can be said to be the core component of the mask and the filter layer in the middle of the mask. It …

PTFE single-component clothing film is an indispensable and important material in the production of masks. It can be said to be the core component of the mask and the filter layer in the middle of the mask. It has good filtering and barrier properties and can effectively block bacteria. Invasion of viruses.

The filtration performance of the melt-blown non-woven fabric itself is not greater than 70%. Merely relying on the first four modes of action for mechanical blocking cannot meet the filtration requirements. Blindly increasing the thickness of the material will increase the breathing/inhaling resistance of the mask.

Therefore, it is the most common practice in the industry to use electrostatic adsorption to improve the filtration efficiency of melt-blown filter materials through the electrostatic electret process, which can achieve a filtration efficiency of more than 99.9%.

PTFE single-component clothing membrane has a three-dimensional mesh structure with no through holes.

The porosity and pore size distribution are important indicators for measuring PTFE membrane.

The porosity of ptfe filter membrane is generally between 80% and 95%.

High porosity will increase ventilation; the pore size distribution is concentrated, indicating that the membrane pore size is uniform.

It also has good filterability for special gases with high temperature, high humidity, high corrosion and organic liquids.

Suzhou New Material Technology Co., Ltd. is a PTFE composite material manufacturer specializing in the R&D and production of PTFE single-component clothing films. After years of painstaking research and R&D, the company not only has strong R&D capabilities and complete testing methods As well as domestic advanced experimental equipment, it has attracted a large number of outstanding technical talents.

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Author: clsrich

 
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