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Surface dust removal ptfe high efficiency filter paper manufacturer



PTFE high-efficiency filter paper prepared through a biaxial stretching process is a polymer compound polymerized by tetrafluoroethylene. It has excellent high temperature resistance, oxidation resistance, alka…

PTFE high-efficiency filter paper prepared through a biaxial stretching process is a polymer compound polymerized by tetrafluoroethylene. It has excellent high temperature resistance, oxidation resistance, alkali resistance, hydrophobicity, and non-adhesive properties. In terms of quality, this material also has functional features that other ordinary filter materials do not have.

It is widely used in air filtration, aviation, electronics, electrical appliances, chemical industry, machinery, construction, textile and many other fields.

?ptfe high-efficiency filter paper manufacturer’s filter material porosity can reach more than 88%, or even higher, and this membrane has 1.4 billion micropores per square centimeter, with a pore size range of 0.1um-0.5um, and has high and low temperature resistance Excellent performance (-200℃-260℃), no aging, no splitting, no discoloration, and strong weather resistance after long-term use.

It can ensure complete retention of bacteria and other impurities while having a large flux.

?ptfe high-efficiency filter paper manufacturer is engaged in technology development, transfer, consulting, and services in the field of new materials; R&D, production, sales, and customization; and a provider of high-efficiency separation and filter material design solutions.

Has a full set of advanced production equipment, an advanced clean room and an independent composite slitting workshop to ensure the production quality of PTFE film; and uses production testing instruments imported from the United States to test the quality of PTFE film .

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This article is from the Internet, does not represent Composite Fabric,bonded Fabric,Lamination Fabric position, reproduced please specify the source.https://www.tradetextile.com/archives/11200

Author: clsrich

 
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